Automated IVS optical metrology systems
Europe representative for Inspectrology IVS products
Easy to use critical dimension and overlay IVS optical system
EUMETRYS, EUropeanMETRologysYStem company
, is a service company dedicated to support automatic metrology systems for semiconductor, compound semiconductor, MEMs and LEDs factories in Europe.
EUMETRYS, using number of years of expertise
in optical measurement, sells optical metrology systems and spare parts
, provides maintenance and applications services for metrology tools and customer trainings (process and maintenance) for the Micro-Electro-Mechanical systems (MEMs), semiconductor, compound semiconductor (GaAs, GaN, SiC, InP), and LED (Light Emitting Diode) factories.
EUMETRYS is the OEM representative to sell and support the IVS product line from INSPECTROLOGY LLC Company in Europe
New Inspectrology IVS 200 model
EUMETRYS now sells the new best COO automated optical measurement IVS200 system in the market
The new IVS 200 model demonstrates advanced performances compared to the previous model of the IVS brand, the IVS1xx systems, while integrating a new semi standard user interface. More than just classical CD and overlay automatic measurements, the IVS200 offers a large range of metrology algorithms allowing the measurement of a great range of structures for the semiconductor, MEMS, LED, power and photonics industries. For instance, it allows the user to measure VIAs using new algorithm of circle fitting and some line width with various orientations.
This new IVS200 model allows large flexibility in term of measurement to enable its usage in compound semiconductor as well as in semiconductor when TPUT and cost efficiency are keys for your success
For system brochure (PDF) Please request
Photo flexible handling on IVS systems: from 75mm to 200mm without modification
EUMETRYS is selling a flexible handling automatic optical metrology system for semiconductor, MEMS, LED, power and photonic industries.
This IVS200 optical measurement tool is specialized in the CD (Critical Dimension or Line Width) measurement and overlay registration measurement.
It is built to handle various substrates sizes and types from 3” to 8” without any hardware change. It can measure transparent substrates as well as bonded silicium wafers without any hardware change.
EUMETRYS represents INSPECTROLOGY with the IVS product line in Europe. We sell the new model IVS200 with the best cost of ownership for the market of 200mm substrate and below.
For system brochure (PDF) Please request
Remanufactured models and tool upgrade to IVS200
For budget consideration, we sell second hand systems without any caveats: warranty and specifications are guarantied
With Inspectrology, we consider that all customers needs is worth a cost-effective solution. Therefore, we decided to supply second hand system fully remanufactured by our services.
Our manufacturing site uses its expertise to remanufactured the different legacy models IVS120 / IVS130 / IVS135 / IVS155 / IVS165 / IVS185 systems that we build over the years and update it to the latest and greatest IVS200 software.
All of these systems are delivered according to their original guarantied specifications, acceptance, training
and 12 months of warranty. They are fully supported by our services and our factory technical support
For remanufactured system brochure (PDF) Please request
Available upgrade to IVS200
All legacy IVS system models can be upgraded to the latest IVS200 software with new SEMI-Standard WIN7 GUI and performance improvement.
Legacy IVS1x models would benefit for 20% improvement in precision, 30% improvement in TPUT and recover their full serviceability.
Two upgrade options are proposed by our services:
1 - On-site upgrade. The warranty will cover only the replaced spare parts and new software
2 - Re-manufacturing upgrade at our factory. The tool will then be delivered with 1-year full warranty.
EUMETRYS support the different upgrades to the IVS system and supply all necessary spare parts
for the IVS product line (all models).
For upgrade system brochure (PDF) Please request
The optical metrology IVS system, an advanced automated platform running 75mm-200mm wafers (without any hardware change) is allowing the following metrology capabilities.
For transparent substrates, we support a dedicated IVS system using a transparent aligner system based on an innovative imaging source; this allows measurement of clear wafers and advanced technology substrates from Glass, Quartz, GaN, GaAs, LiN and SiC substrates.
In-chip or monitoring of CD & overlay measurement in the same recipe – for standard production tracking
The tool is able to locate and measure CD, overlay or various patterns within the chip of your product for the production product control.
In-chip CD measurement
In-chip overlay registration measurement
From sub-micron CD or pitch measurements for advanced technology nodes to rather large CD or pitch measurements thank to a large objectives panel from 150X to 2.5X
For the various customer need, the IVS200 system software is allowing the user’s to measure standard CD as well as sub-micronic CD or pretty large CD upto the field of view size.
Sub micronics CD or pitch measurement
Large CD or pitch measurement
New SiC / InP substrates
The IVS200 system is able to measure challenging new substrates pattern using the transparent option for power
industries and VCSEL
The IVS200 system is currently in use in most compound semiconductor
manufacturer with volume production requirement.
Ridge CD of photonics
Laser opening for VCSEL
Structural 3D measurement algorithm
Structural MEMs, CD, CD height and VIA metrology (thank to circle fitting measurement capabilities) are commonly is use for the IVS200 system users.
The versatility of the IVS200 software allows the customer to measure in-chip or inside the scribe line for various metrology control on challenging layers.
Challenging VIAs in chip
MEMs printer head pad
Structural LED, VCSEL / Laser, CD measurement and VIA metrology
On new technology, the customer measurement demand had changed and the IVS200 system has been developed accordingly. The tool offers new Via algorithm and new capabilities to measure VCSEL aperture for instance.
In-chip VIAs measurement
VCSEL aperture measurement
Strong proven overlay capability down to 110nm semiconductor processes
The IVS200 system is the cost-effective solution for measuring overlay registration feature in advance layer challenging context as well as difficult structures down to 110nm Process node.
TiN overlay capability
Semi standard overlay advance layer
Specific measurement of very large overlays at the LETI – NanoImprint Lithography (NIL)
Sub micronics CD or pitch measurement
Exotic overlay pattern measurement and verniers
In the new compound semiconductor production, the overlay demand is not always using the SEMI standard feature target to measure the overlay.
The IVS200 system is allowing non-standard overlay feature measurement including (non exhaustive list) cross in a cross, verniers, …
For each customer demand our applications team is working to find a solution for the customer.
Exotic overlay pattern
IVS200 in Virtual Reality
EUMETRYS is pleased to demonstrate its technology to customer using Virtual Reality capabilities directly available from our web site.
We use the 3D Virtual Reality for IVS200
to present the tool capability on customer demand. We decided to use this technology directly accessible from our web site to show the customer its privilege to review our measurement system capabilities. Please note that we also use the 3D Augmented Reality to show the exceptional foot print of this automatic CD and overlay measurement system.
NUMIX company, specialist of 3D Virtual Reality and Augmented Reality, was driving the project of highlighting the main key added values of the IVS200 product line to our customers. They helped us to integrate the versatility of the IVS system and measurement flexibility. The 3D is showing all available options that can be proposed on this system: HSMS GEM Automation, IVS tool remote access, offline recipes generation, automatic offline recipes generation, OCR, new measurement templates on demand to suits your needs.