IVS 220 is now released !

EUMETRYS and INSPECTROLOGY announced the release of the new IVS 220. The new tool features 165 wafer per hour throughput and sub 1nm precision.
Designed to meet today's advanced metrology needs, a number of features have been added to the system to build on the solid reputation of the IVS series metrology systems. "We have significantly improved throughput and tightened the precision. It was critical for us to maintain the MTBF that the IVS systems are legendary for while pushing performance limits." said Neal Casa, Inspectrology Vice President.
Moreover, IVS 220 allows reducing metrology cost of ownership while meeting ever-tightening process requirements.
Moreover, IVS 220 allows reducing metrology cost of ownership while meeting ever-tightening process requirements.
