Certified feedback and information from the users
Process managers highlight reviews about our services

XFAB – Electronique pour l’Automobile

I appreciate the open atmosphere in all discussions from the first presentation of the upgrade opportunity throughout the complete project.

I’m very happy that EUMETRYS is taking care for the IVS 200 system upgrade of the several thousand measurement recipes. In our case, the upgrade worked with 98% success rate.

They took over the matching between old and new tools.

We were able to do the exchange while the production was running without real interruption.

I didn’t hear of such service from other overlay tool vendors.

Björn Hildebrandt
Senior Engineer Lithography Processes
X-FAB Semiconductor Foundries GmbH


I want to testify about the quality of the collaboration with EUMETRYS. We currently have one equipment installed in our 200mm MEMS manufacturing line. It is used for optical on-line CD and overlay measurements. The reactivity and efficiency of the company in terms of maintenance and support application, including a continuous training service, guarantees us the use of the equipment under optimum operating conditions.

This ability to develop non-standard recipes gives us the necessary flexibility for an R & D environment such as CEA-LETI.

Olivier Faynot
Manager of the patterning activity of the Silicon Technologies Department
CEA Leti

ABB Switzerland – Dispositifs de puissance

I appreciate working with EUMETRYS as a supplier of the service support for our INSPECTROLOGY IVS metrology system.

The tool is key to us for the Canon stepper qualification and daily lithography tracking.

This metrology system helped ABB in Lenzburg in improving the yield. The EUMETRYS support team, particularly responsive, allows the IVS tool to reach over 98% uptime for a 1800H recorded MTBF. Simply Efficient!  Manfred Kraxenberger
Wafer Fab Manager
ABB Lenzburg

ACCELINK Denmark - Guides d’ondes

The measurement accuracy was around 100 nm in the past.

Our products are sensitive to changes down to 30 nm.

The IVS measurement system ensures more stable yield and has given us the possibility to step up our production capacity at the same time.

Gudrun Thrastardottir M. Sc.
Senior Process Engineer