Eumetrys at SEMICON Europa 2025
Eumetrys will be attending SEMICON Europa 2025, showcasing its latest metrology, inspection and robotics solutions dedicated to the semiconductor industry.
Discover our advanced equipment portfolio from particle surface scanners for transparent and semi-transparent wafers (SiC, GaN, GaAs, Sapphire, Silicon) to PL mapping systems for defect and stacking fault classification, thin film and material characterization tools (Hall effect, ECV, stress analysis), and the world’s leading FOUP & FOSB cleaners for <30nm IC fabs.
Our Eumetrys Robotics division will also present its expertise in repairs, refurbishment, and spare parts supply for robots, aligners, and loadports featuring certified OEM parts, fast delivery, 12-month warranty, and ISO 9001 quality processes.
Whether you’re looking to improve yield, extend equipment lifetime, or explore new analytical solutions, our team of experts will be glad to meet you on site.
Book a meeting now and let’s discuss how Eumetrys can support your fab’s performance.
Eumetrys will be attending SEMICON Europa 2025, showcasing its latest metrology, inspection and robotics solutions dedicated to the semiconductor industry.
Discover our advanced equipment portfolio from particle surface scanners for transparent and semi-transparent wafers (SiC, GaN, GaAs, Sapphire, Silicon) to PL mapping systems for defect and stacking fault classification, thin film and material characterization tools (Hall effect, ECV, stress analysis), and the world’s leading FOUP & FOSB cleaners for <30nm IC fabs.
Our Eumetrys Robotics division will also present its expertise in repairs, refurbishment, and spare parts supply for robots, aligners, and loadports featuring certified OEM parts, fast delivery, 12-month warranty, and ISO 9001 quality processes.
Whether you’re looking to improve yield, extend equipment lifetime, or explore new analytical solutions, our team of experts will be glad to meet you on site.
Book a meeting now and let’s discuss how Eumetrys can support your fab’s performance.