Optical metrology for stepper control and matching
Automated IVS systems for overlay measurement

ApplicationsStepper Qualification
Stepper Control and Matching
Process Control

In order to control the capability of the photolithography equipment, the daily overlay control is preferred and therefore the automated IVS optical overlay registration measurement system is the solution for technology from 110nm to well above 10um process node.

The stepper matching protocol is part of the daily tracking of the customer production facility and the overlay measurement tool is the only one metrology system allowing the control of the stepper’s parameters.